Characteristics of a-Si Thin-Film Transistors with an Inorganic Black Matrix on the Top (Special Issue on Liquid-Crystal Displays)
スポンサーリンク
概要
- 論文の詳細を見る
The characteristics of a-Si bottom-gate TFT test devices with several kinds of inorganic "quasi-black matrix," such as metal, semiconductor, and insulator, on the top were investigated for various black matrix (BM) resistivities. In the I_d-V_g characteristics, for a BM sheet resistance of about 〜 1 × 10^lt12gtΩ/□, a high off current and large V_ltthgt shift were observed due to the back-gating effects when the BM is charged up. According to the ac dynamic characteristics, there was almost no leakage due to the capacitive coupling between source and drain after 16.6 msec (one frame) when the BM sheet resistance was above 〜 7 × 10^lt13gtΩ/□. It was found that hydrogenated amorphous silicon germanium (a-SiGe:H) film, which has enough optical density, with the sheet resistance above the order of 1O^lt14gtΩ/□ is a promising candidate for an inorganic BM on TFT array.
- 社団法人電子情報通信学会の論文
- 1996-08-25
著者
-
Kato Yoshimine
Ibm Japan Yamato Lab.
-
Kato Yoshimine
Display Technology Ibm Japan
-
Palmateer Lauren
Ibm Thomas J. Watson Research Center:dpix A Xerox Company
-
MIYOSHI Yuki
Display Technology, IBM Japan
-
ATSUMI Masakazu
Display Technology, IBM Japan
-
KAIDA Yoshimasa
Display Technology, IBM Japan
-
WRIGHT Steven
IBM Thomas J. Watson Research Center
-
Atsumi Masakazu
Display Technology Ibm Japan
-
MIY0SHI Yuichi
Kyoto Research Laboratory, Matsushita Electronics Corporation
-
Miyoshi Y
Kyoto Research Laboratory Matsushita Electronics Corporation
関連論文
- Characteristics of a-Si Thin-Film Transistors with an Inorganic Black Matrix on the Top (Special Issue on Liquid-Crystal Displays)
- Back-Gate Effects of Amorphous-Si TFTs with an Inorganic Black Matrix on Array
- Particle Growth Caused by Film Deposition in VLSI Manufacturing Process (Special Issue on Scientific ULSI Manufacturing Technology)
- a-SiGe:H and a-SiGeC:H black-matrix films for Liquid Crystal Displays