Molecular Dynamics Simulations on Structural Characteristics of Al Thin Films in Early Sputtering Process

概要

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By using a molecular dynamics method, a film formation in an early sputtering process was modeled, and structural properties of Al thin films sputter-deposited on Al crystal substrate were simulated. Simulations were conducted for modeled sputtering conditions which were specified by the substrate temperature T_<si> and the incident energy of atom E_i. When the substrate temperature was changed, no significant difference was observed in the radial distribution function, though an island-like structure was remarkable in the film simulated for a lower T_<si>. Structures of simulated films were generally near crystal type in the entire region of E_i investigated in this study. To discuss simulated structures quantitatively, an apparent density was defined for a simulated film. The defined apparent density of film was smaller in the region of lower E_i, Where the island-like structure occupied a larger portion in a film. The apparent density was also found to increase with increasing T_<si> and/or E_i.
一般社団法人日本機械学会の論文
1999-07-15