K-0912 パルス電析により作成したニッケル薄膜の表面ラフニング(G04-3 破壊ほか)(G04 機械材料・材料加工部門一般講演)

概要

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We have studied the kinetic surface roughening of pulse-current electrodeposited nickel thin films on ITO glasses at a low current density using atomic force microscopy (AFM). The growth exhibits scaling behaviors characterized by the roughness exponent α and growth exponent β The analysis of the AFM images of the nickel films reveals that α=0.92 and β=0.65 for pulse-current electrodeposition. The value of α is in good agreement with that in direct-current electrodeposition predicted by the diffusion-driven growth model. X-ray diffraction indicated the presence of the four preferred growth orientation of the electrodeposited nickel films, which gives an explanation for the growth exponent β less than in direct-current deposition.
一般社団法人日本機械学会の論文
2001-08-22