K-0708 二重イオン注入した金属材料の硬化機構(S07-2 薄膜の機能性)(S07 表面改質とその機能特性評価)

概要

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The dual implantation of silicon and carbon ions into copper and iron was carried out with a MeV ion accelerator. Analysis by transmission electron microscopy revealed that the ion implanted layer of a Cu substrate is crystalline, while that of an Fe substrate is amorphous. The hardness was measured as a function of the depth by a continuous stiffness measurement method with a nano indenter. Dual ion implantation was found to enhance the hardness of a substrate, and the peak hardness occurred at a smaller depth than the peak concentration of the implanted layer. Cross-sectional transmission electron microscope images of ion implanted layers taken under the indentations with various depth showed that the indenter did not fracture the implanted layer, but rather deformed it plastically. These data provide us with a qualitative understanding of the hardening mechanism.
一般社団法人日本機械学会の論文
2001-08-22