134 Three Dimensional Molecular Dynamic Simulation of AFM-Based Nano Lithography Process for Fabrication of MEMS Components
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概要
- 論文の詳細を見る
The atomic force microscopy (AFM)-based nano lithographic technique is currently used to directly machine material surfaces and fabricate nano/micro components for MEMS (micro electro mechanical system). As such, three-dimensional molecular dynamic computer simulations were conducted to evaluate the characteristics of the nano lithography process. In this study, the 3-dimensional molecular dynamic (MD) simulations were carried out on monocrystalline copper by varying specific combinations of the crystal orientation and cutting (plowing) direction to investigate their effect on the nature of the deformation.
- 一般社団法人日本機械学会の論文
著者
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KIM Y.
Kyungpook National University
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Yang S.
Kyungpook National University
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Choi S.
Korea Institute of Industrial Technology
関連論文
- Representations of Superfields : Particles and Fields
- 134 Three Dimensional Molecular Dynamic Simulation of AFM-Based Nano Lithography Process for Fabrication of MEMS Components