PROFILE AND SURFACE MEASUREMENT TOOL FOR HIGH ASPECT-RATIO MICROSTRUCTURES
スポンサーリンク
概要
- 論文の詳細を見る
A MEMS device for the measurement of profile on high aspect-ratio microstructures has been developed. The goal was to develop a method to be used when the known methods were inappropriate. The main part of the tool is a silicon micro-probe with a sharp tip at its end and an integrated piezoresistive strain gauge sensor. The probes are from 500μm to 1mm long with a cross section area of 20×20(μm)^2; they were mainly designed for the characterization of narrow and deep "EDM" micromachined micro-holes having a radius as small as 50μm and a depth up to 800μm. The profile measurement method has been extended to the characterization of several other microstructures. The measurement accuracy is around ±30nm.
- 社団法人日本機械学会の論文
著者
-
Jalabert Laurent
Cnrs-iis And Cirmm University Of Tokyo
-
Jalabert L
Univ. Tokyo Tokyo Jpn
-
Pourciel Jean
LIMMS
-
Masuzawa Takahisa
LIMMS
-
Masuzawa T
Univ. Tokyo Tokyo Jpn
関連論文
- PROFILE AND SURFACE MEASUREMENT TOOL FOR HIGH ASPECT-RATIO MICROSTRUCTURES
- Profile and Surface Measurement Tool for High Aspect-ratio Microstructures(Advances in Motion and Vibration Control Technology)
- EFFECT OF MAGNETIZATION ORIENTATION AND MAGNETIC BIAS FIELD IN A MAGNETOSTRICTIVELY-ACTUATED, SILICON-BASED MICROACTUATOR