磁気軸受形イオン注入装置ディスク回転機構の振動制御特性

概要

論文の詳細を見る
The end station of an ion implanting machine contains a rotating disk on which several semiconductor wafers are mounted to be exposed uniformly to ion beams of dopants. The recent trend of using higher beam energy and higher rotational speed of the disk requires a sufficient capability of suppressing rotor vibrations in a high-vacuum environment. To meet this requirement, a new system using a magnetic bearing has been developed. Two methods of unbalance force cancellation and automatic balancing were tested against a large amount of unbalance oscillation force, with satisfactory results of reducing vibration amplitude and bearing force fluctuation, respectively.
一般社団法人日本機械学会の論文
1994-05-25