Film Thickness in Gas-Liquid Two-Phase Flow : 4fh Report, Film Thinning Mechanism During the Drainage
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概要
- 論文の詳細を見る
In a gas-liquid two-phase upward flow system with a flow obstacle, it has been reported in previous papers, the water film thickness below the obstacle is extremely reduced due to a drainage, which is caused by the prevention of a reverse flow of water film surrounding a gas slug. This paper presents an experimental and analytical approach to understand the film thinning mechanism during the drainage. A physical background for the formation of the minimum film thickness is also provided, and the film thinning effect due to drainage is suggested to be principal cause producing dry patch under diabatic condition.
- 一般社団法人日本機械学会の論文
著者
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Kawakami Yasushi
Ube Technical College
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FUKANO Tohru
Faculty of Engineering, Kyushu University
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SEKOGUCHI Kotohiko
Faculty of Engineering, Kyushu University
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SHIMIZU Hideo
Ube Technical College
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Fukano Tohru
Faculty Of Eng. Kyushu Univ.
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Sekoguchi Kotohiko
Faculty Of Engineering Kyushu University
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Sekoguchi Kotohiko
Faculty Of Eng. Kyushu Univ.
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Sekoguchi Kotohiko
Faculty Of Engineering 36 Kyushu University
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