Frequency Dependence of H.f.Plugging of a Plasma
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概要
- 論文の詳細を見る
It is found that there are two ortimum frectuencies for the H.F. plugging of amirro confined plasma. By observing the frequency shift caused by the capaci-lance externally added to the high frequency electrodes, the lower frequency isconfirmed to be a series resonance. The higher frequency, which is not changedby the capacitance, can be explained by a parallel resonance due to the plasma re-sonance. Such capacitive coupling processes will the sufficient to explain the pre-viously observed results whiclt have been attributed to an ion cyclotron waveexcited by the applied H.F. frequency voltage.
- 社団法人日本物理学会の論文
- 1982-05-15
著者
-
Tsuzuki Masataka
Chubu Institute Of Technology
-
Ikezawa Shunjiro
Chubu Institute Of Technology
-
Takeda Susumu
Chubu Institute Of Technology
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