Influence of Growth Conditions on Amorphous Germanium Films Prepared by Vacuum-Evaporation

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概要

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• Amorphous germanium films under various growth conditions are investigated byX-ray diffraction and the method of densimetry. The density decreases continuouslywith decreasing deposition rate, and when the deposition ratc ranges from 1.7 X 10 'to 5.1 nm/s, the density changes from 2.77 to 4.63 g/cm'. Furthermore, the densitiesare 2.91 g/cm' at a pressure of 0.12Pa and ?4.3 g/cm'at N 10 'Pa under the samedeposition rate of 0.38 nm/ s. It can be concluded that the most possible origin for thelow density is the existing residual gas.

• 社団法人日本物理学会の論文
• 1987-08-15

著者

• Tatsumi Y

  Natural Science Faculty Of Education Sinshu University

• Honda Hirokazu

  Natural Science Faculty Of Education Sinshu University

• TATSUMI Yukichi

  Natural Science, Faculty of Education, Shinshu University

• IKEGAMI Kaori

  Natural Science,Faculty of Education,Sinshu University

• NAITO Shinichi

  Natural Science,Faculty of Education,Sinshu University

• Ikegami K

  Electrotechnical Laboratory

• Naito S

  Faculty Of Economics And Information Gifu Shoutokugakuen University

• Ikegami Kaori

  Natural Science Faculty Of Education Sinshu University

関連論文

• Structure of the Natural Oxide of Amorphous Silicon
• Densimetry of Amorphous Silicon Films by Using a Quartz Oscillator
• Influence of Growth Conditions on Amorphous Germanium Films Prepared by Vacuum-Evaporation
• Absolute Quantum Yields and Lifetimes of Photosensitized Phosphorescence of Singlet Oxygen O_2(^1Δ_g) in Air-Saturated Aqueous and Organic Solutions of Phenalenone
• Determination of Phosphorescence Quantum Yield of Singlet Oxygen O_2(^1Δ_g) Photosensitized by Phenalenone in Air-Saturated Carbon Tetrachloride
• Formation of Singlet Oxygen Photosensitized by Aromaic Amino Acids in Aqueous Solutions

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