レーザビーム描画における露光線幅の制御(第2報) : デフォーカスによる線幅制御

概要

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This paper describes a method of controlling the pattern width for laser beam writing. Line width control is one of the fastest and most efficient ways modulating the laser beam for making photo mask patterns. A small change in the beam "waist" (defocusing) can result in a big change in the line width. First, a theoretical analysis is made, suggesting that line width is controllable over a wide range by using the defocusing method. Secondly, experimental equipment and procedures are described. By using a large numerical aperture lens and a focusing actuator to defocus the laser beam continuously, the beam waist pattern is exposed to the photo resist. Lastly, experimental results are compared with the theoretical predictions. Taking into account the sensitivity of the photo resist to the Gaussian beam laser, a good correlation is shown to exist between the experimental results and theoretical analysis. Furthef discussion concludes that constant power density writing offers a wider control range of line width than constant power writing.
公益社団法人精密工学会の論文
1999-08-05