Photostimulated Desorption of NO Chemisorbed on Pt(001) at 193 nm

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概要

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• Photostimulated desorption of NO chemisorbed on a Pt(001) surface at 80 K has been studied with an ArF excimer laser (λ=193 nm). Desorbed neutral NO molecules in the X^2II_<1/2,3/2>(υ=0, J) state are detected by a (1+1)-resonance-enhanced multiphoton ionization technique. The NO desorption is found to be the one-photon process induced by laser irradiation. Up to the internal energies of 1000 cm^<-1> for desorbed NO, the distribution is nearly Boltzmann with rotational temperature of ~300 K The translational-energy distribution can be fitted by the Maxwell distribution with translational temperature of 530 K. These results show that desorption of NO chemisorbed on a Pt(001) surface is induced by valence electron excitation. A drastic increase of the desorption cross section is found when the amount of NO exposure exceeds ~1.8 L. This result suggests that NO species in the higher NO coverage is most sensitive to photostimulated desorption. This adsorption state selectivity is characteristic of the non-thermal process.

• 理論物理学刊行会の論文
• 1992-02-25

著者

• MASE Kazuhiko

  Institute of Materials Structure Science

• Mase K

  Inst. Molecular Sci. Okazaki Jpn

• Mase Kazuhiko

  Institute Of Material Structure Science High Energy Accelerator Research Organization

• Mase Kazuhiko

  Institute For Solid State Physics The University Of Tokyo : Riken The Institute Of Physical And Chem

• MURATA Yoshitada

  Institute for Solid State Physics, University of Tokyo

• Murata Y

  Univ. Electro‐communications Tokyo

• Murata Yoshitada

  Institute For Solid State Physics The Univeristy Of Tokyo

• Murata Yoshitada

  Institute For Solid State Physics

• Mase Kazuhiko

  Institute of Material Structure Science, High Energy Accelerator Research Organization

• MASE Kazuhiko

  Institute for Solid State Physics, The University of Tokyo : RIKEN, The Institute of Physical and Chemical Research

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