TiNおよびTi-Al-N系膜の酸化機構

概要

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Ti-Al-N films were deposited using an activated reactive evaporation (ARE) method with single vapor source of Ti-Al alloys. Oxidation behaviors of Ti-Al-N films were investigated in dry air in the temperature range from 673K to 1173K. Oxidation layers of the films were characterized by XRD, EPMA, XPS and TEM. The results are summarized as follows. (1) The oxidation characteristics of Ti-Al-N films improved more than 200 degrees camparing that of TiN film and the oxidation resistance of Ti-Al-N films increase with an increase of Al content in the films. (2) Ti-Al-N films obtained by an ARE method had a cubic B1 structure. Ti atoms in the films were substituted by Al atoms. (3) TiN films changed directly to TiO_2 in high temperature oxidation and no Ti-O-N compounds were observed at the interface. (4) TiO_2 and Al_2O_3 compounds were observed after oxidation of the Ti-Al-N films and Ai_2O_3 enriched at the surface of the films. This is the reason that the Ti-Al-N films show a good resistance to the oxidation at the high temperature.High-TemperatureOxidationTiNTi-Al-N filmesHard coatingActivated reactive evaporation
東北大学の論文