<RESEARCH REPORT>Secondary Electron Emission from a Metal Surface Bombarded by Slow Multiply Charged Ions
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概要
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Pulse height distributions of a microchannel plate (MCP) for impact of slow multiply charged ions have been measured. It was observed that a relative gain of the MCP increases with an increase of the charge state of incident ions. Such gain characteristics is discussed in connection with secondary electron emission yield at the input of the MCP. Next, absolute values of electron emission yield γ for impact of Ar^<q+>(q=1-8) on a polycrystalline tantalum and gold surface have been measured. The values of γ are nearly proportional to the total potential (neutralization) energy of the incident ions.
- 核融合科学研究所の論文
著者
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Takagi S.
Research Information Center, Institute of Plasma Physics, Nagoya University
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Ohtani S.
Research Information Center, Institute of Plasma Physics, Nagoya University
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Tawara H.
Research Information Center Institute Of Plasma Physics Nagoya University
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Oda K.
Research Information Center, Institute of Plasma Physics, Nagoya University
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Ichimiya A.
Research Information Center, Institute of Plasma Physics, Nagoya University
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Yasue Y.
Research Information Center, Institute of Plasma Physics, Nagoya University
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Ichimiya A.
Research Information Center Institute Of Plasma Physics Nagoya University:department Of Applied Phys
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Yasue Y.
Research Information Center Institute Of Plasma Physics Nagoya University:department Of Applied Physics Nagoya University
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