Integration of Low-k Dielectric Liner in Through Silicon Via and Thermomechanical Stress Relief
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概要
- 論文の詳細を見る
- 2012-12-25
著者
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Tan Chuan
Nanyang Technological University, 50 Nanyang Avenue, Singapore 639798
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Zhang Lin
Nanyang Technological University, 50 Nanyang Avenue, Singapore 639798
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Li Hongyu
Institute of Microbiology, School of Life Science, Lanzhou University
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ZHANG Jiye
Nanyang Technological University
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GHOSH Kaushik
Nanyang Technological University
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DONG Yuanwei
University of British Columbia
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TAN Cher
Nanyang Technological University
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XIA Guangrui
University of British Columbia
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ZHANG Lin
Nanyang Technological University
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TAN Chuan
Nanyang Technological University
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LI Hongyu
Institute of Microelectronics, A^* STAR
関連論文
- Through Silicon Via Fabrication with Low-\kappa Dielectric Liner and Its Implications on Parasitic Capacitance and Leakage Current
- Reversal Effect of Arsenic Sensitivity in Human Leukemia Cell Line K562 and K562/ADM Using Realgar Transforming Solution
- Integration of Low-k Dielectric Liner in Through Silicon Via and Thermomechanical Stress Relief