Positive Magnetoresistance in Amorphous Ni-CN_x/p-Si Heterostructure
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概要
- 論文の詳細を見る
- Japan Society of Applied Physicsの論文
- 2012-04-25
著者
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Ma Li
Tianjin Key Laboratory Of Film Electronic And Communication Devices School Of Electronics Information And Communications Engineering Tianjin University Of Technology
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WANG Xiaocha
Tianjin Key Laboratory of Film Electronic and Communication Devices, School of Electronics Information and Communications Engineering, Tianjin University of Technology
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MI Wenbo
Tianjin Key Laboratory of Low-Dimensional Materials Physics and Preparation Technology, Institute of Advanced Materials Physics, Faculty of Science, Tianjin University
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Mi Wenbo
Tianjin Key Laboratory Of Low-dimensional Materials Physics And Preparation Technology Institute Of Advanced Materials Physics Faculty Of Science Tianjin University
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Wang Xiaocha
Tianjin Key Laboratory Of Film Electronic And Communication Devices School Of Electronics Information And Communications Engineering Tianjin University Of Technology
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Mi Wenbo
Tianjin Key Laboratory of Low Dimensional Materials Physics and Preparing Technology, Institute of Advanced Materials Physics, Faculty of Science, Tianjin University, Tianjin 300072, P. R. China
関連論文
- Ferromagnetism in Reactive Sputtered Cu0.96Fe0.04O1-\delta Nanocrystalline Films Evidenced by Anomalous Hall Effect
- Positive Magnetoresistance in Amorphous Ni-CN_x/p-Si Heterostructure