Schottky Barrier Inhomogeneities in Nickel Silicide Transrotational Contacts
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概要
- 論文の詳細を見る
- 2011-11-25
著者
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La Magna
Cnr-imm
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ALBERTI Alessandra
CNR-IMM
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ROCCAFORTE Fabrizio
CNR-IMM
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LIBERTINO Sebania
CNR-IMM
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BONGIORNO Corrado
CNR-IMM
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Magna Antonino
CNR-IMM, Zona Industriale Strada VIII N°5, 95121 Catania, Italy
関連論文
- Electrical Properties of Ultrathin SiO_2 Layer Deposited at 50℃ by Inductively Coupled Plasma-Enahnced Chemical Vapor Deposition
- Schottky Barrier Inhomogeneities in Nickel Silicide Transrotational Contacts