Nanostructure of W03 sputtered films deposited at various gas pressures (第50回真空に関する連合講演会プロシーディングス)
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概要
- 論文の詳細を見る
Deep investigations were performed for further understanding of the nanostructure of sputtered WO3 films. The as-deposited films consisted of fine crystallites of several nm. As the pressure increased, the film density decreased and the surface area increased owing to open pores between grains. When films were annealed at 400°C or above, they were well crystallized to form monoclinic and randomly-shaped grains. Upon this crystallization, the film shrank and its density increased slightly, while the relative surface area substantially decreased.
- 日本真空協会の論文
- 2010-03-20
著者
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KAWABATA Tokimasa
Graduate School of Science and Engineering, University of Toyama
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Kawabata Tokimasa
Graduate School Of Science And Engineering University Of Toyama
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Yamazaki Toshinari
Graduate School Of Science And Engineering University Of Toyama
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Kikuta Toshio
Graduate School Of Science And Engineering University Of Toyama
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SHAALAN Nagih
Graduate School of Science and Engineering, University of Toyama
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Shaalan Nagih
Graduate School Of Science And Engineering University Of Toyama
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Yamazaki Toshinari
Graduate School Of Science And Engineering For Research University Of Toyama
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Kawabata Tokimasa
Graduate School Of Science And Engineering For Research University Of Toyama
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