Effect of thermal imprinting conditions on fabricated micro/nano patterns in tin phosphate glass
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概要
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Thermal imprinting conditions of low-softening tin phosphate glass with a composition of 67 mol% SnO-33 mol% P2O5 were investigated using three processing parameters of temperature, imprinting pressure, and holding time. Fabrication conditions of a micro square grid (SG) pattern with a similar depth of silica mold (∼120 nm) were optimized. AFM observations confirmed that the 700 nm × 700 nm SG pattern with ∼120 nm depth could be formed with good reproducibility.
- 2009-06-01
著者
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Kuwabara Makoto
Faculty Of Engineering Sciences Kyushu University
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Nakamura Shingo
Graduate School Of Engineering Sciences Kyushu University
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Suzuki Gaku
Technical Research Institute Toppan Printing Co. Ltd.
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TAKATA Shunichi
Graduate School of Engineering Sciences, Kyushu University
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CHA Jaemin
Graduate School of Engineering Sciences, Kyushu University
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TAKEBE Hiromichi
Graduate School of Science and Engineering, Ehime University
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SOMA Munehisa
Technical Research Institute, Toppan Printing Co., Ltd.
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TANAKA Satoru
SCIVAX Co.
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Cha Jaemin
Graduate School Of Engineering Sciences Kyushu University
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Soma Munehisa
Technical Research Institute Toppan Printing Co. Ltd.
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Takata Shunichi
Graduate School Of Engineering Sciences Kyushu University
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Takebe Hiromichi
Graduate School Of Science And Engineering Ehime University
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Kuwabara Makoto
Faculty Of Engineering Kyushu Institute Of Technology
関連論文
- Effect of thermal imprinting conditions on fabricated micro/nano patterns in tin phosphate glass
- Compositional dependence of photoelasticity of tin phosphate glasses(Glass and Ceramic Materials for Photonics)
- Compositional dependence of properties of SnO-P_2O_5 glasses
- Fabrication and Photovoltaic Measurements of Surface Nanostructure of AlGaInN-Based Photodetector
- Preparation of High-T_c Superconducting Y-Ba-Cu-O Ceramics and Their Grain Morphologies
- Compositional dependence of photoelasticity of tin phosphate glasses