Properties of Amorphous Silicon Nitride Films Deposited by PE-CVD

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概要

• 論文の詳細を見る
• 2002-08-05

著者

• Yokoyama Takuya

  Fuji Electric Co. Ltd

• ICHIKAWA Yukimi

  Fuji Electric Corporate Research and Development, Ltd.

• NARITA Masataka

  Fuji Electric Co., Ltd

• Narita Masataka

  Fuji Electric Co. Ltd

• Ichikawa Yukimi

  Fuji Electric Co. Ltd

関連論文

• Excitation Frequency Effects on Large-Area Hydrogenated Amorphous Silicon Film Deposition Process Using Flexible Film Substrate : Semiconductors
• Formation of CuIn(Ga)Se_2 Thin Films by Selenization and Application to Solar Cells
• Properties of Amorphous Silicon Nitride Films Deposited by PE-CVD
• Structural Properties of P-Type Microcrystalline Silicon as a Window Layerof Solar Cells

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