Characterization of the Sc_2O_3/La_2O_3 High-κ Gate Stack by STM
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概要
- 論文の詳細を見る
- 2007-09-19
著者
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Kakushima K.
Frontier Collaborative Research Center Tokyo Institute Of Technology
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ONG Y.
School of Electrical and Electronic Engineering, Nanyang Technological University
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ANG D.
School of Electrical and Electronic Engineering, Nanyang Technological University
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PEY K.
School of Electrical and Electronic Engineering, Nanyang Technological University
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KAWANAGO T.
Frontier Collaborative Research Center, Tokyo Institute of Technology
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IWAI H.
Frontier Collaborative Research Center, Tokyo Institute of Technology
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Pey K.
School Of Electrical And Electronic Engineering Nanyang Technological University
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Kawanago T.
Frontier Collaborative Research Center Tokyo Institute Of Technology
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O'shea S.
Insititute Of Material Research And Engineering
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Ang D.
School Of Electrical And Electronic Engineering Nanyang Technological University
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Ong Y.
School Of Electrical And Electronic Engineering Nanyang Technological University
関連論文
- Characterization of the Sc_2O_3/La_2O_3 High-κ Gate Stack by STM
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