ESR and PL Study of Charge Trapping Centers in Silicon Nitride Films and Its Verification with Novel ONO-Sidewall 2-bit/cell Nonvolatile Memory
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概要
- 論文の詳細を見る
- 2007-09-19
著者
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Kotaki Hiroshi
Sharp Corporation Corporate Research And Development Group
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Toki Atsushi
Kagawa University Dept. Of Advanced Materials Science Faculty Of Engineering
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Kamigaki Yoshiaki
Kagawa University Dept. Of Advanced Materials Science Faculty Of Engineering
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SHINOHARA Noriaki
Kagawa University, Dept. of Advanced Materials Science, Faculty of Engineering
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NAKANO Masayuki
Sharp Corporation, Corporate Research and Development Group
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Nakano Masayuki
Sharp Corporation Corporate Research And Development Group
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Shinohara Noriaki
Kagawa University Dept. Of Advanced Materials Science Faculty Of Engineering