New method of probing barrier integrity and low-k stability
スポンサーリンク
概要
- 論文の詳細を見る
- 2006-09-13
著者
-
Park Y.
Silicon Technology Development Texas Instruments Inc.
-
Kim Choong-un
Materials Science And Engineering The University Of Texas At Arlington
-
MENG D.
Materials Science and Engineering, The University of Texas at Arlington
-
BANG W.-H.
Materials Science and Engineering, The University of Texas at Arlington
-
MICHAEL N.
Materials Science and Engineering, The University of Texas at Arlington
-
MATZ L.
Silicon Technology Development, Texas Instruments, Inc.
-
Matz L.
Silicon Technology Development Texas Instruments Inc.
-
Bang W.-h.
Materials Science And Engineering The University Of Texas At Arlington
-
Meng D.
Materials Science And Engineering The University Of Texas At Arlington
関連論文
- New method of probing barrier integrity and low-k stability
- Bit Distribution and Reliability of High Density 1.5 V Ferroelectric Random Access Memory Embedded with 130 nm, 5 lm Copper Complementary Metal Oxide Semiconductor Logic