Overview and Future Challenge of FeRAM Technologies
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概要
- 論文の詳細を見る
- 2006-09-13
著者
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Isogai K.
Ulsi Process Technology Development Center Matsushita Electric Industrial Co. Ltd.
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KATO Y.
Semiconductor Device Research Center, Matsushita Electric Industrial Co., Ltd
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KANEKO Y.
Semiconductor Device Research Center, Matsushita Electric Industrial Co., Ltd
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TANAKA H.
Semiconductor Device Research Center, Matsushita Electric Industrial Co., Ltd
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KAIBARA K.
Semiconductor Device Research Center, Matsushita Electric Industrial Co., Ltd
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SHIMADA Y.
Semiconductor Device Research Center, Matsushita Electric Industrial Co., Ltd
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Kaibara K.
Semiconductor Device Research Center Matsushita Electric Industrial Co. Ltd
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Kaibara K.
Semiconductor Company Matsushita Electric Industrial Co. Ltd.
関連論文
- Overview and Future Challenge of FeRAM Technologies
- Impact of the Grain Size and Orientation of SrBi_2(Ta,Nb)_2O_9 Films on the Polarization for Nano-Scale FeRAMs