A new low temperature APM cleaning process to improve ONO integrity in 0.18μm stacked-gate EEPROM memory
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概要
- 論文の詳細を見る
- 2005-09-13
著者
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Shukla Dhruva
Process Integration Department Systems On Silicon Manufacturing Co. Pte. Ltd.
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Zhao Jing
Process Integration Department Systems On Silicon Manufacturing Co. Pte. Ltd.
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Zhang Wenyi
Process Integration Department Systems On Silicon Manufacturing Co. Pte. Ltd.
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Kim Nam
Process Integration Department Systems On Silicon Manufacturing Co. Pte. Ltd.
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NG Junsyong
Process Integration Department, Systems on Silicon Manufacturing Co. Pte. Ltd.
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WONG Kumfai
Process Integration Department, Systems on Silicon Manufacturing Co. Pte. Ltd.
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MUKHOPADHYAY M.
Process Integration Department, Systems on Silicon Manufacturing Co. Pte. Ltd.
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Ng Junsyong
Process Integration Department Systems On Silicon Manufacturing Co. Pte. Ltd.
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Wong Kumfai
Process Integration Department Systems On Silicon Manufacturing Co. Pte. Ltd.
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Mukhopadhyay M.
Process Integration Department Systems On Silicon Manufacturing Co. Pte. Ltd.
関連論文
- Impact of Co-salicide capping layer on GIDL in High Voltage devices for Embedded Flash memory
- A new low temperature APM cleaning process to improve ONO integrity in 0.18μm stacked-gate EEPROM memory