Influences of Ion Implantation Damages on Elevated Source/Drain Formation for Ultra-Thin Body SOI MOSFET
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概要
- 論文の詳細を見る
- 2005-09-13
著者
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KOYANAGI M.
Dept. of Machine Intelligence and Systems Engineering, Tohoku University
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Bea J.
Japan Sci. And Technol. Agency (jst)
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Bea J.
Japan Science And Technology Corporation (jst)
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OH H.
Dept. of Bioengineering and Robotics, Tohoku University
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SAKAGUCHI T.
Dept. of Bioengineering and Robotics, Tohoku University
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FUKUSIMA T.
Dept. of Bioengineering and Robotics, Tohoku University
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Koyanagi M.
Dept. Of Machine Intelligence And System Engineering Tohoku University
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Fukusima T.
Dept. Of Bioengineering And Robotics Tohoku University
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Koyanagi M.
Dept. Of Bioengineering And Robotics Graduate School Of Engineering Tohoku University
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Koyanagi M.
Dept. Of Bioengineering And Robotics Tohoku University
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Koyanagi M.
Dept. Biophys. Facl. Sci. Kyoto Univ.
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