TDS measurement for low-k porous silica films incorporated with ethylene groups
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概要
- 論文の詳細を見る
- 2004-09-15
著者
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Ito Yoshito
Teikyo Univ. Of Sci & Tech Dept Of Media Science
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Uchida Yasutaka
Teikyo Univ. Of Sci & Tech Dept Of Media Science
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Katoh Tomohiro
Teikyo Univ. Of Sci & Tech Dept Of Media Science
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MARUYA Yoshiyuki
Teikyo Univ. of Sci & Tech, Dept of Media Science
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ISHIDA Koichi
Teikyo Univ. of Sci & Tech, Dept of Media Science
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Maruya Yoshiyuki
Teikyo Univ. Of Sci & Tech Dept Of Media Science
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Ishida Koichi
Teikyo Univ. Of Sci & Tech Dept Of Media Science
関連論文
- A Fluorinated Organic-Silica Film with Extremely Low Dielectric Constant
- Fabrication of SiO_2/Ge MIS structures by plasma oxidation of ultrathin Si films grown on Ge
- TDS measurement for low-k porous silica films incorporated with ethylene groups