Excellent Ferroelectric Properties in PZT Capacitor Cell with Thin SRO Film in Both Top and Bottom Electrodes

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概要

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1999-09-20

著者

Kumura Y.
Microelectronics Engineering Laboratory Toshiba Corporation Semiconductor Company
Arisumi O.
Microelectronics Engineering Laboratory Toshiba Corporation Semiconductor Company
MORIMOTO T.
Microelectronics Engineering Laboratory, Toshiba Corporation, Semiconductor company
HIDAKA O.
Microelectronics Engineering Laboratory, Toshiba Corporation, Semiconductor company
YAMAKAWA K.
Microelectronics Engineering Laboratory, Toshiba Corporation, Semiconductor company
KANAYA H.
Microelectronics Engineering Laboratory, Toshiba Corporation, Semiconductor company
IWAMOTO T.
Corporate Manufacturing Engineering Center, Toshiba Corporation
KUNISHIMA I.
Microelectronics Engineering Laboratory, Toshiba Corporation, Semiconductor company
TANAKA S.
Microelectronics Engineering Laboratory, Toshiba Corporation, Semiconductor company
Kunishima I.
Microelectronics Engineering Laboratory Toshiba Corporation Semiconductor Company

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