Direct Electroless Copper Plating on Glass
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概要
- 論文の詳細を見る
Direct copper deposition on glass without etching is difficult to obtain by the conventional electroless copper treatment process. The formation of copper films on glass without exfoliation of copper from the glass substrate can be accomplished by introducing an alcohol treatment after the conventional sensitization and activation steps. This was followed by the electroless copper deposition.Adhesion strength was improved by heat treatment under an inert atmosphere. Furthermore, copper circuit patterns with widths of 4 to 6μm were formed by the semi-additive process.
- 一般社団法人 表面技術協会の論文
- 2007-10-01
著者
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Honma Hideo
Kanto Gakuin University Surface Engineering Research Institute
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Seida Hiroyuki
Faculty Of Engineering Kanto Gakuin University
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WATANABE Mitsuhiro
Kanto Gakuin University Surface Engineering Research Institute
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Honma Hideo
Kanto Gakuin Univ. Kanagawa
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Watanabe Mitsuhiro
Kanto Gakuin Univ. Surface Engineering Res. Inst. Co. Ltd. Kanagawa
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Watanabe Mitsuhiro
Kanto Gakuin Surface Engineering Research Institute
関連論文
- Direct Electroless Copper Plating on Glass
- Pretreatment of Nickel Plating on ASA Resin Using Ozonated Water as Replacement for Chromic Acid Etching
- Surface Modification of Polyimide Using UV Light and Formation of Circuit Patterns
- Effects of α,ω-Diphenylazophenoxy Polyethylene Glycol on Copper Deposition
- Formation of Fine Circuit Patterns on Cyclo Olefin Polymer Film
- Influences of Electroless Nickel Film Conditions on Electroless Au/Pd/Ni Wire Bondability
- Effects of Terminal-modified Polyethylene Glycol Derivatives as Additives for Through Hole Plating