Mo Thin Film Prepared by Capacitively Coupled Neutral Loop discharge Sputter System and its Plasma Characteristics

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概要

• 論文の詳細を見る
• 2002-01-31

著者

• Otsubo M

  Miyazaki University

• OKRAKU-YIRENKY Y.

  Miyazaki University

• NAKAMURA Y.

  Miyazaki University

• SUNG Y.

  Miyazaki University

• HONDA C.

  Miyazaki University

関連論文

• Mo Thin Film Prepared by Capacitively Coupled Neutral Loop discharge Sputter System and its Plasma Characteristics
• Ion Current Component in the Ionization Current Multiplication Factor

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