Effect of daytime light conditions on sleep habits and morningness-eveningness preference of Japanese students aged 12-15 years
スポンサーリンク
概要
- 論文の詳細を見る
- 2002-06-01
著者
-
Harada Tetsuo
Laboratory Of Environmental Physiology Faculty Of Education Kochi University
-
Takeuchi Hitomi
Laboratory of Environmental Physiology, Faculty of Education, Kochi University
-
MORISANE HIROMI
Laboratory of Environmental Physiology, Faculty of Education, Kochi University
-
Takeuchi Hitomi
Laboratory Of Environmental Physiology Faculty Of Education Kochi University
-
Morisane Hiromi
Laboratory Of Environmental Physiology Faculty Of Education Kochi University
-
Harada Tetsuo
Laboratory of Advanced Science and Technology for Industry, University of Hyogo, Kamigoori, Hyogo 678-1205, Japan
-
HARADA Tetsuo
Laboratory of Advanced Science and Technology for Industry, University of Hyogo
関連論文
- An Integrated Effect of Protein Intake at Breakfast and Morning Exposure to Sunlight on the Circadian Typology in Japanese Infants Aged 2-6 Years
- Effects of Meal Habits and Alcohol/Cigarette Consumption on Morningness-Eveningness Preference and Sleep Habits by Japanese Female Students Aged 18-29
- PB2-3 Comparative Study on the Effects of Breakfast and Supper on Circadian Typology and Seep Habit of Japanese Infants Aged 0-6 yrs(Proceedings of The 8th International Congress of Physiological Anthropology)
- Correlation between Breakfast Tryptophan Content and Morningness-Eveningness in Japanese Infants and Students Aged 0-15 yrs
- Morningness-eveningness preference and mood in Japanese junior high school students
- Effect of daytime light conditions on sleep habits and morningness-eveningness preference of Japanese students aged 12-15 years
- Photoperiodic changes according to global warming in wing-form determination and diapause induction of a water strider, Aquarius paludum (Heteroptera : Gerridae)
- In-situ Contamination Thickness Measurement by Novel Resist Evaluation System at NewSUBARU
- Transmission Grating Fabrication for Replicating Resist Patterns of 20 nm and Below
- At-Wavelength Extreme Ultraviolet Lithography Mask Observation Using a High-Magnification Objective with Three Multilayer Mirrors