Observation of OH Radical Reactions with Atomic Hydrogen in He/H2O Plasmas by Laser-Induced Fluorescence Spectroscopy
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概要
- 論文の詳細を見る
A novel atmospheric pressure plasma device that generates atomic hydrogen has been developed. The reaction of OH radicals with atomic hydrogen supplied from the device was investigated in a He/H2O mixture at a pressure of 530 Torr by laser-induced fluorescence (LIF) spectroscopy. OH radicals were generated using a dielectric barrier discharge (DBD) plasma and excited to $\text{A}{^{2}}\Sigma^{+}(v'=1)$ from $\text{X}{^{2}\Pi}(v''=0)$ by a frequency-doubled dye laser (282 nm). When the device was operated, OH-LIF intensity was reduced near the DBD plasma. The spatial density profile of the OH radicals was also obtained when the device was turned on and off. The reaction mechanism was briefly discussed.
- Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
- 2006-10-30
著者
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NAMBA Shinichi
Graduate School of Engineering, Hiroshima University
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TAKIYAMA Ken
Graduate School of Engineering, Hiroshima University
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Takiyama Ken
Graduate School Of Engineering Hiroshima University
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Namba Shinichi
Hiroshima Univ. Hiroshima Jpn
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Namba Shinichi
Graduate School Of Engineering Hiroshima University
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Yamasaki Tsutomu
Graduate School Of Engineering Hiroshima University
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Nojima Hideo
Digital Appliances R&d Center Samsung Electronics Co. Ltd.
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Shoji Akira
Graduate School of Engineering, Hiroshima University, Higashi-Hiroshima, Hiroshima 739-8527, Japan
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Kwon Jun-Hyoun
Digital Appliances R&D Center, Samsung Electronics Co., Ltd., 416, Maetan-3 Dong, Yeongtong-Gu, Suwo
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Park Rae-Eun
Digital Appliances R&D Center, Samsung Electronics Co., Ltd., 416, Maetan-3 Dong, Yeongtong-Gu, Suwo
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Park Rae-eun
Digital Appliances R&d Center Samsung Electronics Co. Ltd.
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Kwon Jun-hyoun
Digital Appliances R&d Center Samsung Electronics Co. Ltd.
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Shoji Akira
Graduate School Of Engineering Hiroshima University
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