In-Situ TEM Study of the Thickness Impact on the Crystallization Features of a Near Equal-Atomic TiNi Thin Film Prepared by Planar Magnetron Sputtering
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概要
- 論文の詳細を見る
- Japan Institute of Metalsの論文
- 2006-03-20
著者
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Zhang Ze
Institute Of Microstructure And Property Of Advanced Materials Beijing University Of Technology
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Wei Qun
Institute Of Microstructure And Property Of Advanced Materials Beijing University Of Technology
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MAO Shengcheng
Institute of Microstructure and Property of Advanced Materials, Beijing University of Technology
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HAN Xiaodong
Institute of Microstructure and Property of Advanced Materials, Beijing University of Technology
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ZHANG YueFei
Institute of Microstructure and Property of Advanced Materials, Beijing University of Technology
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Zhang Yuefei
Institute Of Microstructure And Property Of Advanced Materials Beijing University Of Technology
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Han Xiaodong
Institute Of Microstructure And Property Of Advanced Materials Beijing University Of Technology
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Mao Shengcheng
Institute Of Microstructure And Property Of Advanced Materials Beijing University Of Technology
関連論文
- Achieving Multiple Resistance States in Phase-Change Memory Cell
- Effect of Cyclic Loading on Apparent Young's Modulus and Critical Stress in Nano-Subgrained Superelastic NiTi Shape Memory Alloys
- In-Situ TEM Study of the Thickness Impact on the Crystallization Features of a Near Equal-Atomic TiNi Thin Film Prepared by Planar Magnetron Sputtering