The Control of Sidelobe Intensity with Arrangement of the Chrome Pattern (COSAC) in Half-Tone Phase-Shifting Mask
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概要
- 論文の詳細を見る
- 1995-08-21
著者
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Sakiyama K.
Vlsi Development Laboratories Tenri Ic Group Sharp Corporation
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Sakiyama K.
Vlsi Development Laboratories Ic Group Sharp Corporation
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KOBAYASHI S.
VLSI Development Laboratories, Tenri IC Group, Sharp Corporation
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OKA N.
VLSI Development Laboratories, Tenri IC Group, Sharp Corporation
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WATANABE K.
VLSI Development Laboratories, Tenri IC Group, Sharp Corporation
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INOUE M.
VLSI Development Laboratories, Tenri IC Group, Sharp Corporation
関連論文
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- The Control of Sidelobe Intensity with Arrangement of the Chrome Pattern (COSAC) in Half-Tone Phase-Shifting Mask