Simple Kinetic Model of ECR-RIBE Reacor for the Optimization of GaAs Etching Process

Department of Physics, University of Alberta

Department of Rheumatology,Juntendo University School of Medicine

Department Of Chemical System Engineering University Of Tokyo

Department Of Chemical Engineering University Of Tokyo

Department of Materials Engineering, University of Tokyo

Department of Electronic Engineering, Faculty of Engineering, University of Tokyo

Plasma System Corporation

Department of Electronic Engineering, Faculty of Engineering, University of Tokyo

Department Of Materials Engineering University Of Tokyo

Department Of Electronic Engineering Faculty Of Engineering University Of Tokyo

Department Of Electronic Engineering Faculty Of Engineering University Of Tokyo