Low-Temperature Chemical-Vapor-Deposition of Silicon-Nitride Film from Hexachloro-Disilane and Hydrazine
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概要
- 論文の詳細を見る
- 1995-08-21
著者
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Yeh W.
Department Of Electrical Engineering National University Of Kaohsiung
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MATSUMURA M.
Department of Pedodontics, Osaka University Graduate School of Dentistry
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Yeh W.
Department Of Physical Electronics Tokyo Institute Of Technology
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ISHIHARA R.
Department of Physical Electronics, Tokyo Institute of Technology
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MORISHITA S.
Department of Physical Electronics, Tokyo Institute of Technology
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Morishita S.
Department Of Obstetrics And Gynecology Gifu University School Of Medicine
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