Novel Nozzle-Scan Coating Method for Low-k Films
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概要
- 論文の詳細を見る
- 2000-08-28
著者
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OKUMURA K.
Process and Manufacturing Engineering Center, Semiconductor Company, Toshiba Corp.
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NAKATA R.
Process & Manufacturing Engineering Center, Semiconductor Company Toshiba Corporation
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Esaki Y.
R&d Dept. Tokyo Electron Kyushu Ltd.
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YAMADA N.
PROCESS & MANUFACTURING ENGINEERING CENTER, TOSHIBA CORPORATION
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KAJITA A.
SYSTEM LSI DEVELOPMENT CENTER, TOSHIBA CORPORATION
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ITO S.
PROCESS & MANUFACTURING ENGINEERING CENTER, TOSHIBA CORPORATION
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KITANO T.
R&D Dept., Tokyo Electron Kyushu Ltd.
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MORIKAWA M.
R&D Dept., Tokyo Electron Kyushu Ltd.
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TAKESHITA K.
R&D Dept., Tokyo Electron Kyushu Ltd.
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ESAKI Y.
R&D Dept., Tokyo Electron Kyushu Ltd.
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AKIMOTO M.
R&D Dept., Tokyo Electron Kyushu Ltd.
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Kitano T.
R&d Dept. Tokyo Electron Kyushu Ltd.
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Takeshita K.
R&d Dept. Tokyo Electron Kyushu Ltd.
関連論文
- Flash Lamp Anneal Technology for Effectively Activating Ion Implanted Si
- Comparison between UV and EB cure method for porous PAr / porous MSX hybrid structure
- Novel Nozzle-Scan Coating Method for Low-k Films