Transmission Electron Microscopic Study of TiSi_2 Microstructures and the C49-C54 Phase Transformation in Narrow Lines
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概要
- 論文の詳細を見る
- 1998-09-07
著者
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Hirashita N.
Vlsi Research & Development Center Oki Electric Industry Co. Ltd.
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KAGEYAMA M.
LSI Production Division, OKI Electric Industry Co., Ltd.
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HARADA Y.
LSI Production Division, OKI Electric Industry Co., Ltd.
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OKIHARA M.
VLSI Research & Development Center, Oki Electric Industry Co., Ltd.
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TAI K.
LSI Production Division, Oki Electric Industry Co., Ltd.
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ONODA H.
LSI Production Division, Oki Electric Industry Co., Ltd.
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Okihara M.
Vlsi Research & Development Center Oki Electric Industry Co. Ltd.
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Kageyama M.
Lsi Production Division Oki Electric Industry Co. Ltd.
関連論文
- High Density 0.16μm Embedded-DRAM-ASIC Process Technology for a SoC Platform
- Transmission Electron Microscopic Study of TiSi_2 Microstructures and the C49-C54 Phase Transformation in Narrow Lines