Fabrication Process of Si Memory Dot and Quantum Channel Based on As Dopant Statistical Distribution Effect

スポンサーリンク

概要

• 論文の詳細を見る
• 1997-09-16

著者

• Tang Xiaohui

  Universite Catholique De Louvain

• Colinge J.

  Universite Catholique De Louvain

• BAIE X.

  Universite Catholique de Louvain

関連論文

• Fabrication of Twin Nano Silicon Wires Based on Arsenic Dopant Effect
• Fabrication Process of Si Memory Dot and Quantum Channel Based on As Dopant Statistical Distribution Effect

スポンサーリンク