The Analysis of Defective Cell Induced by COP in 0.3 microns Technology Node DRAM
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概要
- 論文の詳細を見る
- 1997-09-16
著者
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Miura M
Department Of Electrical And Electronic Engineering Faculty Of Engineering Muroran Institute Of Tech
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Kawamura M
Device Development Center Hitachi Ltd.
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MIURA Muneyuki
Tokyo Institute of Technology, Department of Textile and Polymeric Materials
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Kaeriyama Toshiyuki
Semiconductor Group Texas Instruments Inc. Located Device Development Center Hitachi Ltd.
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IWAI Hidetoshi
Device Development Center, Hitachi Ltd.
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KAWAMURA Masao
Device Development Center, Hitachi Ltd.
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TADAKI Yoshitaka
Device Development Center, Hitachi Ltd.
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MURANAKA Masaya
ULSI Development Dept., Hitachi ULSI Engineering Corp.
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MIURA Masashi
ULSI Development Dept., Hitachi ULSI Engineering Corp.
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KAERIYAMA Toshiyuki
Manufacturing Capability Development, Semiconductor Group, Texas Instruments Inc.
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Iwai Hidetoshi
Device Development Center Hitachi Ltd.
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Tadaki Yoshitaka
Device Development Center Hitachi Ltd.
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