Birefringence Writing and Erasing in Ultra-Low-Birefringence Fibers by Polarized Ultraviolet Side-Exposure : Origin and Applications
スポンサーリンク
概要
- 論文の詳細を見る
- 1997-02-01
著者
-
Meyer Thomas
Metrology Laboratory Epfl Swiss-federal Institute Of Technology
-
NICATI Pierre
Metrology Laboratory, EPFL Swiss-Federal Institute of Technology
-
ROBERT Philippe
Metrology Laboratory, EPFL Swiss-Federal Institute of Technology
-
VARELAS Dimitris
Applied Optics Laboratory, EPFL Swiss-Federal Institute of Technology
-
LIMBERGER Hans
Applied Optics Laboratory, EPFL Swiss-Federal Institute of Technology
-
SALATHE Rene
Applied Optics Laboratory, EPFL Swiss-Federal Institute of Technology
-
Salathe Rene
Applied Optics Laboratory Epfl Swiss-federal Institute Of Technology
-
Nicati P‐a
Metrology Laboratory Epfl Swiss-federal Institute Of Technology
-
Limberger Hans
Applied Optics Laboratory Epfl Swiss-federal Institute Of Technology
-
Robert Philippe
Metrology Laboratory Epfl Swiss-federal Institute Of Technology
-
Nicati Pierre
Metrology Laboratory Epfl Swiss-federal Institute Of Technology
-
Varelas Dimitris
Applied Optics Laboratory Epfl Swiss-federal Institute Of Technology