High-Performance Low-k Dielectric Using Advanced EB-Cure Process

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概要

• 論文の詳細を見る
• 2001-09-25

著者

• Yoda Tadashi

  Department Of Electronic Science And Engineering Kyoto University

• SHIMADA Miyoko

  TOSHIBA CORPORATION SEMICONDUCTOR COMPANY

• MIYAJIMA Hideshi

  TOSHIBA CORPORATION SEMICONDUCTOR COMPANY

• NAKATA Rempei

  TOSHIBA CORPORATION SEMICONDUCTOR COMPANY

• YODA Takashi

  TOSHIBA CORPORATION SEMICONDUCTOR COMPANY

関連論文

• Submolecular-Resolution Studies on Metal-Phthalocyanines by Noncontact Atomic Force Microscopy
• Properties of High-Performance Porous SiOC Low-k Film Fabricated Using Electron-Beam Curing
• Structural Studies of High-Performance Low-k Dielectric Materials Improved by Electron-Beam Curing
• High-Performance SiOF Film Fabricated Using a Dual-Frequency-Plasma Chemical Vapor Deposition system
• High-Performance Low-k Dielectric Using Advanced EB-Cure Process
• Submolecular-Resolution Studies on Metal-Phthalocyanines by Noncontact Atomic Force Microscopy

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