Relativistic Focus Condition for E-Beam Projection Lithography

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概要

• 論文の詳細を見る
• Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
• 2004-12-15

著者

• Kim Jung-il

  School Of Physics Seoul National University

• Park Gun-sik

  School Of Physics Seoul National University

• Yoo In-kyeong

  U-team Samsung Advanced Institute Of Technology

• WEI Yanyu

  School of Physics, Seoul National University

• KIM Dong-Wook

  U-team, Samsung Advanced Institute of Technology

• Wei Yanyu

  School Of Physics Seoul National University

関連論文

• Relativistic Focus Condition for E-Beam Projection Lithography
• Electromagnetic Wave Propagation through an Azimuthally Asymmetric Helix Slow Wave Structure
• Smith-Purcell Radiation with Three-Dimensional Simulation
• Simplified Approach to the Nonlinear Analysis in Helix Slow-Wave-Structure for a Traveling Wave Tube
• Analysis of Axis-Encircling Electron Beam Using a Single-Cusp Magnetic Field
• Relativistic Focus Condition for E-Beam Projection Lithography
• Electromagnetic Wave Propagation through an Azimuthally Asymmetric Helix Slow Wave Structure

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