The Impact of Lens Distortion on Dynamic Imaging in Photolithography

概要

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In dynamic imaging static lens distortion has a detrimental impact on the image contrast of dense mask patterns and leads to blurring of images of isolated features, thus decreasing process window in lithographic applications. A new method is proposed here for combining transversal vibrations caused by the stage synchronization error of reticle and wafer stages and the lens distortion in lithographic step-and-scan exposure systems. Merging the descriptions of both effects into a unique characteristic function, the combined probability density function, allows us to quantify the individual contributions to the total result, to assess the mutual interaction of both effects and finally to calculate the impact of the combined effects on the projected dynamic image. The characteristic function characterizes the resulting image blur and is used here to study the impact of specific lens distortion fingerprints. The method presented here is also applicable to other types of transversal vibrations and can be extended to combine several vibration effects into one characteristic function.
Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
2004-12-15