Stress Effect on Aluminum-Induced Crystallization of Sputtered Amorphous Silicon Thin Films
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概要
- 論文の詳細を見る
- Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
- 2003-08-15
著者
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HSU Ching-Ming
Department of Electrical Engineering, Southern Taiwan University of Technology
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Hsu Ching-ming
Department Of Electrical Engineering Southern Taiwan University Of Technology
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CHEN Ian-Fu
Department of Electrical Engineering, Southern Taiwan University of Technology
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YU Ming-Chang
Department of Electrical Engineering, Southern Taiwan University of Technology
関連論文
- Evidence from the Low-Temperature Specific Heat for d-Ware Pairing Symmetry in Pr_Ce_CuO_4
- Stress Effect on Aluminum-Induced Crystallization of Sputtered Amorphous Silicon Thin Films
- Stress Effect on Aluminum-Induced Crystallization of Sputtered Amorphous Silicon Thin Films
- Evidence from the Low-Temperature Specific Heat for d-Ware Pairing Symmetry in Pr1.85Ce0.15CuO4