Novel Approach to Chemically Amplified Resist Materials for Next Generation of Lithography
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概要
- 論文の詳細を見る
- Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
- 2003-06-30
著者
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Kim Dae-yong
Basicrresearch Laboratory Electronics And Telecommunications Research Institute
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Suh Dong
School Of Chemical Engineering College Of Engineering Hanyang University
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Suh Dong
School Of Chemical Engineering Hanyang University
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PARK Kyoung-sun
School of Chemical Engineering, Hanyang University
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CHOI Sang-kuk
BasicRresearch Laboratory, Electronics and Telecommunications Research Institute
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Choi Sang-kuk
Basicrresearch Laboratory Electronics And Telecommunications Research Institute
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Park Kyoung-sun
School Of Chemical Engineering Hanyang University
関連論文
- Novel Approach to Chemically Amplified Resist Materials for Next Generation of Lithography
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