Estimation of Optimum Electron-Beam Projection Lithography Mask Biases Taking Coulomb Beam Blur into Consideration
スポンサーリンク
概要
- 論文の詳細を見る
- Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
- 2003-06-30
著者
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Kobinata Hideo
Advanced Technology Development Division Nec Electronics Corporation
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Ochiai Yukinori
Silicon Systems Res. Labs Nec Corporation
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Narihiro Mitsuru
Silicon Systems Res. Labs Nec Corporation
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YAMADA Yasuhisa
Advanced Technology Development Division, NEC Electronics Corporation
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TAMURA Takao
Advanced Technology Development Division, NEC Electronics Corporation
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FUJII Kiyoshi
Advanced Technology Development Division, NEC Electronics Corporation
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Yamada Yasuhisa
Advanced Technology Development Division Nec Electronics Corporation
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Tamura Takao
Advanced Technology Development Division Nec Electronics Corporation
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Fujii Kiyoshi
Advanced Technology Development Division Nec Electronics Corporation