Analysis of Line Edge Roughness Using Probability Process Model for Chemically Amplified Resists

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概要

• 論文の詳細を見る
• Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
• 2003-06-30

著者

• FUKUDA Hiroshi

  Hitachi, Ltd., Central Research Laboratory

• Fukuda Hiroshi

  Hitachi Central Research Laboratory

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• Analysis of Line Edge Roughness Using Probability Process Model for Chemically Amplified Resists
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• Analysis of Line Edge Roughness Using Probability Process Model for Chemically Amplified Resists

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