A fully automated measurement of a hole pattern using image processing technique
スポンサーリンク
概要
- 論文の詳細を見る
- Published for the Japanese Society of Electron Microscopy by Oxford University Pressの論文
- 1998-10-01
著者
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Miyoshi M.
Integrated Circuit Advanced Process Technology Department
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Tsubusaki K.
Integrated Circuit Advanced Process Technology Department
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Komatsu F.
Toshiba Corp. Integrated Circuit Advanced Process Technology Department
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Tsubusaki K.
Toshiba Corp. Integrated Circuit Advanced Process Technology Department
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Motoki H.
Toshiba Corp. Integrated Circuit Advanced Process Technology Department
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MIYOSHI M.
Toshiba Corp. Integrated Circuit Advanced Process Technology Department
関連論文
- Conduction-Band Discontinuity of GaInAs / InP Heterojunctions with Graded Donor Concentration : Semiconductors and Semiconductors Devices
- Measurement of geometrical dimensions using scanning electron microscopy
- A fully automated measurement of a hole pattern using image processing technique