Effects of N/(C+N) Atomic Ratio and Amount of Ti(C,N) on Chemical Reaction of Al2O3-Ti(C,N) Ceramics with Ni Plate (特集 硬質材料)
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概要
- 論文の詳細を見る
The chemical reaction of A1<SUB>2</SUB>O<SUB>3</SUB>-Ti(C, N) ceramics with Ni plate, which occurred by heating those couple at 1463 K, was investigated as a function of the N/(C+N) atomic ratio and amount of Ti(C, N). The followings were obtained: (1) Ni reacted only with Ti(C, N) grains in the ceramics, (2) Ni penetrated into the ceramics, dissolving a large part of Ti(C, N) grains, (3) the thickness of the Ni penetrated-layer, i.e., the chemical reaction-layer, decreased with increasing N/(C+N) atomic ratio and decreasing Ti(C, N) amount, (4) the relation between the thickness and the heating time was almost linear, and (5) the above result that the thickness decreased with increasing N/(C+N) atomic ratio was supposed to be the lower solubility and/or diffusion-rate of N atom in the penetrating-Ni phase than those of Ti and C atoms.
- 社団法人 粉体粉末冶金協会の論文
- 2000-05-15
著者
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HAYASHI Koji
Institute of Industrial Science, The University of Tokyo
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Hayashi K
Institute Of Industrial Science The University Of Tokyo
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KOBAYASHI Masaki
Toshiba Tungaloy Co., Ltd.
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SAITO Takeshi
Toshiba Tungaloy Co.,Ltd.
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TAKAHASHI Toshiyuki
Toshiba Tungaloy Co.,Ltd.
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Saito Takeshi
Toshiba Tungaloy Co. Ltd.
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Kobayashi Masaki
Toshiba Tungaloy Co. Ltd.
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Takahashi Toshiyuki
Toshiba Tungaloy Co. Ltd.
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Hayashi Koji
Institute Of Industrial Science
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